The full EUV optical light path - Inside the TWINSCAN NXE:3400 EUV lithography machine | ASML on Make a GIF
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全球最顶尖的光刻机生产公司ASML NXE:3400B 一台就是12亿元堪称史上最贵半导体设备了
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【ASML 2019第二季財報重點】 #產品重點摘要 ✅ 極紫外光 (EUV) 微影系統：ASML持續強化NXE:3400C的量產效能，不僅在ASML廠內展示每小時曝光超過170片晶圓的實力，在客戶端實際生產記憶體晶片的製造條件下，也成功達到每天曝光超過2,000片晶圓的成果。 ✅ ASML已同意將EUV光罩護膜 (pellicle) 組裝技術授權給日商三井化學公司 (Mitsui Chemicals)。未來，三井化學將能夠為我們的客戶提供大批量的組裝和光罩護膜銷售。同時，ASML將繼續與其合作夥伴共同開發下一代光罩護膜，持續改善EUV光罩護膜的效能。 #展望 展望2019年第三季度，ASML預估銷售淨額可達30億歐元，毛利率約43~44%。研發費用約4.95億歐元，管理支出費用 (SG&A) 約1.25億歐元。ASML預估2019年的年化有效稅率約為9%。 #ASML #QuarterlyResults | ASML
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