A panel representing all aspects of the lithographic ecosystem talked about the future of EUV lithography on February 28th, during the SPIE Advanced Lithography + Patterning conference, in San Jose, ...

Add Yahoo as a preferred source to see more of our stories on Google. A California-based laboratory is set to lay the groundwork for the next evolution of extreme ultraviolet (EUV) lithography. Led by ...

EUV (Extreme Ultraviolet Lithography) has been a very long time coming to market. Initially predicted to be ready by 2004 (if not sooner), we've been waiting 13 years for the technology to arrive.

A technical paper titled “Resistless EUV lithography: photon-induced oxide patterning on silicon” was published by researchers at Paul Scherrer Institute, University College London, ETH Zürich, and ...

Belgium-based semiconductor research institute Imec will present its latest achievements that enable high-numerical aperture (High-NA) extreme ultraviolet (EUV) lithography at the 2024 Advanced ...

TSMC and ASML have announced a key milestone in extreme ultraviolet lithography (EUV) tech this week at the 2015 SPIE conference (SPIE is an international professional society for photonics and optics ...

Making high-NA EUV lithography work will take a manufacturing-worthy approach to stitching together circuits or a wholesale change to larger masks. Circuit stitching between the exposure fields is ...

Steven Scheer: "The opening of the joint ASML-imec High NA EUV Lithography Lab in Veldhoven, the Netherlands, marked a milestone in preparing High NA EUV for adoption in mass manufacturing [1].